Friday 19 June 2015, Amsterdam
The report, now available on ASDReports, “Surface Analysis Market by Instrumentation Technology (Microscopy, Spectroscopy, Surface Analyzers, X-ray Diffraction), Industry (Semiconductor, Polymers, Life Sciences) & End User (Academic Institutes, Industries) – Global Forecast to 2020”, analyzes and studies the major market drivers, restraints, opportunities, challenges, and trends in North America, Europe, Asia-Pacific, and the Rest of the World.
Surface analysis techniques provide a means to correlate performance with surface or a thin film composition. This knowledge can be used in development of new materials or to improve the performance of existing material systems. These techniques are also supports in various industries for optimization and acceleration of new product development, evaluation of production and packaging stability, rapid identification of trace contamination, and quality assessment of new manufacturing processes.
In this report, the surface analysis market is segmented on the basis of instrumentation technology, industry, end user, and region. Based on instrumentation technology, the market is segmented into microscopy, spectroscopy, surface analyzers, and X-ray diffraction. The microscopy segment comprises optical microscopes, electron microscopes, scanning probe microscopes, and confocal microscopes. Based on industries, the market is segmented into semiconductor, energy, polymers, life sciences, metallurgy and metals, and other industries such as food and beverages, textile, and paper and packaging. Based on end users, the market is segmented into academic institutes, industries, and research organizations. This report also discusses key market drivers, restraints, opportunities, and challenges for this market and its submarkets. The global surface analysis market is expected to reach $3,989.7 Million by 2020, at a CAGR of about 6.2% from 2015 to 2020.
The semiconductor industry is the largest end user of surface analysis techniques, with this technique contributing significantly towards the improvement of various applications such as measuring the thickness, density, and composition of films; and characterization of dopant dose and profile shapes in the semiconductor industry. Surface analysis techniques play a vital role in solving some of the major challenges faced by the semiconductor industry, including identifying and locating trace-level impurities in semiconductor stacks, qualifying new production tools, and quantifying bulk dopants, among others. Furthermore, in the last few years, the use of surface analysis techniques has increased in various industries, including energy, healthcare, polymers, thin films, metallurgy, food and beverages, and paper and textile, owing to the rising application of these techniques for defect identification, trace metal contamination detection, depth profiling of thin films or samples, and failure analysis.
In 2014, North America accounted for the largest share of the surface analysis market, followed by Europe, Asia-Pacific, and RoW. The major shares of North America and Europe are primarily attributed to the high investments in nanotechnology research by both public and private sources, increasing research expenditures by medical device companies, and the presence of major companies in this region, which improves consumer accessibility to surface analysis solutions. The future growth of the surface analysis market will be driven by the Asia-Pacific region, owing to the huge investment opportunities in this region due to low-cost resource availability, strong customer base, increasing pharmaceutical R&D expenditures, and growing investments by major companies for establishing R&D and manufacturing facilities in this region. However, high cost of instruments and increased custom duties on medical devices (microscopes) are expected to restrain the growth of this market during the forecast period
The prominent players in the surface analysis market are Danaher Corporation (U.S.), Olympus Corporation (Japan), Thermo Fisher Scientific, Inc. (U.S.), ULVAC-PHI, Inc. (Japan.), Bruker Corporation (U.S.), HORIBA, Ltd. (Japan), Nikon Corporation (Japan), Carl Zeiss AG (Germany), FEI Company (U.S.), Shimadzu Corporation (Japan), and JEOL, Ltd. (Japan).
Publish date : June 2015
Report code : ASDR-205261
Pages : 185